Biasing system for controlling chemical concentration in lamps

Details Biasing system for controlling chemical concentration in lamps Biasing system for controlling chemical concentration in lamps

1992-02-18

1993-08-10

LaRoche, Eugene R.

Electric lamp and discharge devices: systems

Discharge device load

315335, H01J 1104

Patent

active

052352560

ABSTRACT:
A high intensity discharge lamp system includes an AC supply for a chamber within which a plasma conductor is created to generate light. In order to control the concentrations of charged particles within the chamber and to influence migration thereof, a DC circuit taps power from the AC supply and produces a DC potential which is applied to relatively large-surface components in the vicinity of the plasma chamber. Properly polarized, the large-surface components, such as a reflector and a conductive housing, refractor or door, produces electric fields which either inhibit or encourage migration of the charged particles.

REFERENCES:
patent: 2752531 (1956-06-01), Westberg
patent: 3995928 (1976-12-01), Shaffner
patent: 4281274 (1981-07-01), Bechard
patent: 4488091 (1984-12-01), Muzeroll
patent: 4491766 (1985-01-01), Larson
patent: 4899090 (1990-02-01), Yoshiike

Affiliated with

Also associated with

Rating

Biasing system for controlling chemical concentration in lamps does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Biasing system for controlling chemical concentration in lamps, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Biasing system for controlling chemical concentration in lamps will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1728064