Bias scheme for achieving voltage independent capacitance

Electrical transmission or interconnection systems – Personnel safety or limit control features – Interlock

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307304, 357 14, 357 51, H03K 326, H03K 3353, H01L 2708, H01L 2978

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047868287

ABSTRACT:
Described is a capacitive structure that can be fabricated with a digital MOS (Metal Oxide Semiconductor) process. The capacitive structure is comprised of two enhancement mode FET devices electrodes connected in series via their gate electrodes. The source and drain electrodes of each FET device are connected together. A third FET device, biased to operate within the linear or resistive region of its characteristic curve, is connected to the gate electrodes of the enhancement mode FET devices. The structure provides a voltage independent capacitor.

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