Beveled wafer for thermal gradient zone melting utilizing a beve

Metal treatment – Barrier layer stock material – p-n type

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

148 15, 252 623E, 252 623GA, 357 55, H01L 21225

Patent

active

041704967

ABSTRACT:
A body of semiconductor material to be processed by thermal gradient zone melting (TGZM) has an outer side peripheral surface beveled at a predetermined included angle .alpha. with the bottom surface of the body in order that the radiant heat impinging on the beveled side peripheral surface is equal to the radiant heat emitted by the beveled side peripheral surface of the body.

REFERENCES:
patent: 3179860 (1965-04-01), Clark et al.
patent: 3255055 (1966-06-01), Ross
patent: 3697829 (1972-10-01), Huth et al.
patent: 3895967 (1975-07-01), Anthony et al.
patent: 4001047 (1977-01-01), Boah
patent: 4035199 (1977-07-01), Anthony et al.
patent: 4075038 (1978-02-01), Anthony et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Beveled wafer for thermal gradient zone melting utilizing a beve does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Beveled wafer for thermal gradient zone melting utilizing a beve, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Beveled wafer for thermal gradient zone melting utilizing a beve will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1964186

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.