Best focus determining method

Details Best focus determining method Best focus determining method

2005-03-15

2005-03-15

Young, Christopher G. (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Including control feature responsive to a test or measurement

Reexamination Certificate

active

06866975

ABSTRACT:
A best focus determining method. First, a test mask is provided, wherein the test mask comprises a transparent substrate and an opaque layer covering parts of the transparent substrate to define a first transparent area with 0° phase and a second transparent area with 90° phase. The sizes of the two transparent areas are the same. Next, a light source is provided and transmits the test mask to perform an exposure. Then, a first image corresponding to the first transparent area and a second image corresponding to the second transparent area are formed. The sizes of the first and second images are measured to ensure the best focus possible.

REFERENCES:
patent: 5807647 (1998-09-01), Hashimoto
patent: 6376139 (2002-04-01), Fujisawa et al.
patent: 6667139 (2003-12-01), Fujisawa et al.
patent: 20030031943 (2003-02-01), Nakao et al.

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