Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1995-02-24
1996-08-06
Hamilton, Cynthia
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
4302811, 430175, 430171, 4302831, 4302851, 4302721, 4302781, 4302711, 430325, 430916, 430918, 430917, 430923, 430920, 430922, 430921, 430919, 522 12, 522 25, 522 26, 522 27, 522 28, 522 29, 522 30, 522 89, G03F 7016, G03F 709, G03F 730
Patent
active
055432620
ABSTRACT:
A light sensitive composition which is capable of photopolymerization which includes a photopolymerizable compound a free radical generating component and a benzanthrone or substituted benzanthrone which substantially prevents photopolymerization when the light sensitive composition is exposed to actinic radiation below a threshold amount but permits photopolymerization when the light sensitive composition is exposed to actinic radiation above a threshold amount. This achieves a gate effect which eliminates or decreases unwanted partial exposure in the nonimage areas and hence improves reproduction quality.
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Delude John R.
Perron Paul A.
Sypek Maria T.
Doyle Michael J.
Hamilton Cynthia
International Paper Company
Roberts Richard S.
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