Beam recording method and device

Details Beam recording method and device Beam recording method and device

2005-11-22

2010-02-16

Berman, Jack I (Department: 2881)

Radiant energy

Irradiation of objects or material

C250S3960ML, C250S397000, C250S400000, C250S492300, C369S053250, C369S053280, C369S053290, C369S100000, C369S101000

Reexamination Certificate

active

07663124

ABSTRACT:
A recording device including a beam deflection section for relatively moving an irradiation position of an exposure beam with respect to a substrate on which a resist layer is formed; a substrate velocity adjustment section for adjusting a moving velocity of the substrate based on a deflection amount of the exposure beam; and a deflection control section for controlling to change a deflection velocity of the exposure beam during exposure of the recording signals according to the moving velocity of the substrate.

REFERENCES:
patent: 4410800 (1983-10-01), Yoshikawa
patent: 5051556 (1991-09-01), Sakamoto et al.
patent: 5180920 (1993-01-01), Kai et al.
patent: 5465248 (1995-11-01), Fuji
patent: 5654953 (1997-08-01), Yoshida et al.
patent: 6156464 (2000-12-01), Hada
patent: 2003/0034460 (2003-02-01), Ono et al.
patent: 2003/0089858 (2003-05-01), Hotta et al.
patent: 2004/0007679 (2004-01-01), Viviani
patent: 2004/0117757 (2004-06-01), Inanami et al.
patent: 63-55935 (1988-03-01), None
patent: 2000-315637 (2000-11-01), None
patent: 2002-288890 (2002-10-01), None

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