Beam-plasma type ion source

Details Beam-plasma type ion source Beam-plasma type ion source

1975-10-23

1976-12-21

Smith, Alfred E.

Radiant energy

Ion generation

Electron bombardment type

3151119, H01J 724, H01J 2700, H05B 3126

Patent

active

039990729

ABSTRACT:
A beam-plasma type ion source comprises a first section for generating an electron beam, a cylindrical second section for ionizing a gas by virtue of electron bombardment caused by the electron beam generated from the first section, a microwave energy transmission circuit disposed in the second section and connected to receive microwave energy in order to cause plasma ionization, and a third section for collecting the electron beam. The gas introduced into the third section is ionized at the second section and extracted by and accelerated in the first section in the opposite direction to the electron beam way. The first section functions to converge an ion beam to generate a well-focused ion beam toward a desired target by means of ions trapped into a negative-potential well due to the electron beam.

REFERENCES:
patent: 3171053 (1965-02-01), Targ et al.

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