Beam masking to reduce cyclic error in beam launcher of...

Optics: measuring and testing – By light interference – For dimensional measurement

Reexamination Certificate

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Reexamination Certificate

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06922249

ABSTRACT:
Embodiments of the present invention are directed to reducing cyclic error in the beam launcher of an interferometer. In one embodiment, an interferometry apparatus comprises a reference beam directed along a reference path, and a measurement beam spatially separated from the reference beam and being directed along a measurement path contacting a measurement object. The reference beam and the measurement beam have a single frequency. At least a portion of the reference beam and at least a portion of the measurement beam overlapping along a common path. One or more masks are disposed in the common path or in the reference path and the measurement path to spatially isolate the reference beam and the measurement beam from one another.

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patent: 6710880 (2004-03-01), Zhao
patent: WO 3021319 (2003-03-01), None
Ames, Lawrence, et al., “SIM external metrology beam launcher (QP) development,” Lockheed Martin Advanced Technology Ctr./ Lockheed Martin Jet Propulsion Lab, SPIE Conference, Kona Hawaii, 2002 (4852-55).
Halverson, Peter G,, et al., “Techniques for the Reduction of Cyclic Errors in Laser Metrology Gauges for the Space Interferometry Mission,” presented at American Society for Precision Engineering ASPE's 16th Annual Meeting, Nov. 10-15, 2001.
Zhao, Feng, et al. “Development of Sub-nanometer Racetrack Laser Metrology for External Triangulation Measurement for the Space Interfarometry Mission”, presented at American Society for Precision Engineering ASPE's 16th Annual Meeting, Nov. 10-15, 2001.

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