Beam exposure system having improved mask unit

Details Beam exposure system having improved mask unit Beam exposure system having improved mask unit

1997-01-17

1998-03-24

Nguyen, Kiet T.

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

25049222, 250398, 430 5, H01J 37302

Patent

active

057315914

ABSTRACT:
In a beam exposure system, a beam is irradiated onto a mask unit, and the beam passed through the mask unit is deflected and is irradiated onto a target. The mask unit includes a polygonal hollowed holder and a plurality of masks. The holder is formed by mask mounting plates each having apertures for mounting the masks, and frames each having an aperture for passing the beam therethough.

REFERENCES:
patent: 4855197 (1989-08-01), Zapka et al.
patent: 5260579 (1993-11-01), Yasuda et al.
patent: 5334282 (1994-08-01), Nakayama et al.

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