X-ray or gamma ray systems or devices – Specific application – Diffraction – reflection – or scattering analysis
Patent
1985-10-31
1987-04-28
Howell, Janice A.
X-ray or gamma ray systems or devices
Specific application
Diffraction, reflection, or scattering analysis
250398, 2504421, G01K 108, G01N 2320
Patent
active
046619682
ABSTRACT:
A beam exposure apparatus is set forth comprising a mechanism for displacing an object being irradiated. This mechanism involves a drive mechanism. The drive mechanism may be rigidly connected to a wall of the apparatus, and a secondary shaft of the drive mechanism is connected by a friction coupling to a part of the object carrier which is to be positioned. The drive mechanism is driven by a direct current drive motor which is powered by a pulsed direct current. The object can be thus positioned with a step accuracy of approximately 0.2 micron. Such positioning can be measured with this accuracy be means of an inductive position detector.
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Howell Janice A.
Miller Paul R.
U.S. Philips Corporation
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