Beam current stabilization utilizing gas feed control loop

Details Beam current stabilization utilizing gas feed control loop Beam current stabilization utilizing gas feed control loop

2008-04-22

2008-04-22

Berman, Jack I. (Department: 2881)

Radiant energy

Irradiation of objects or material

Irradiation of semiconductor devices

C250S42300F, C250S427000, C250S492200, C250S493100, C250S281000, C250S443100, C250S442110, C315S111810

Reexamination Certificate

active

07361915

ABSTRACT:
One or more aspects of the present invention pertain to stabilizing the current or density of an ion beam within an ion implantation system by selectively adjusting a lone parameter of feed gas flow. Adjusting the gas flow does not necessitate adjustments to other operating parameters and thereby simplifies the stabilization process. This allows the beam current to be stabilized relatively quickly so that ion implantation can begin promptly and continue uninterrupted. This improves throughput while reducing associated implantation costs.

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International Search Report, Int'l Application No. PCT/US/2006/044817, Int'l Filing date Nov. 17, 2006, 3pgs.

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