Beam control method and apparatus

Details Beam control method and apparatus Beam control method and apparatus

1991-03-12

1992-07-28

Berman, Jack I.

Radiant energy

Means to align or position an object relative to a source or...

2504922, G01N 2113

Patent

active

051342987

ABSTRACT:
A beam control method and apparatus for processing a specimen. A specimen is irradiated with a first beam capable of modifying a property of the specimen. Subsequently, a second beam, incapable of modifying a property of the specimen, irradiates the trace formed by the first beam to thereby identify the actual position of the trace by detecting a signal representing the actual position of the trace. On the basis of comparing actual position of the trace with a desired position of the trace, the latter is controlled.

REFERENCES:
patent: 4334139 (1982-06-01), Wittekock et al.
patent: 4356392 (1982-10-01), Wittekock et al.
patent: 4451738 (1984-05-01), Smith
patent: 4698513 (1987-10-01), Tojo et al.
patent: 4777641 (1988-10-01), Inagaki et al.
patent: 4823012 (1989-04-01), Kosugi
patent: 4823014 (1989-04-01), Miyawaki
patent: 4849901 (1989-07-01), Shimizu
patent: 4866262 (1989-04-01), van der Werf et al.
Katsuhiro Harada, "Current Status of E-Beam Lithography", Bull. Japan Soc. of Prec. Engg., vol.22, No. 4, Dec. 1988, pp. 256-262, (Provided in English).

Affiliated with

Also associated with

Rating

Beam control method and apparatus does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Beam control method and apparatus, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Beam control method and apparatus will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1688512