Beam analyzing system and method for analyzing pulsed...

Details Beam analyzing system and method for analyzing pulsed... Beam analyzing system and method for analyzing pulsed...

2007-05-15

2010-02-16

Lyons, Michael A (Department: 2877)

Optics: measuring and testing

By light interference

C356S121000, C356S256000

Reexamination Certificate

active

07663761

ABSTRACT:
The present invention relates to a beam analyzing system and a method for analyzing pulsed particle or laser beams. The inventive beam analyzing system comprises a detector unit, a unit for generating a pulsed reference laser beam, a first electro-optical modulator and a first read-out photo detector, wherein the optical input of the first electro-optical modulator is connected with the unit for generating a pulsed reference laser beam, wherein the optical output of the first electro-optical modulator is connected with the first readout photo detector and wherein the signal input of the first electro-optical modulator is connected with the detector unit. In the inventive method for analyzing a pulsed particle or laser beam first voltage pulses are generated by means of a detector unit, the intensity of a pulsed reference laser beam is modulated by the first voltage pulses, the intensity of the modulated reference laser pulses is measured and the phasing of the first voltage pulses relative to the reference laser pulses is deduced from the intensity of the modulated reference laser pulses.

REFERENCES:
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patent: 5007717 (1991-04-01), Cutolo et al.
patent: 6115126 (2000-09-01), Chen et al.
patent: 6496261 (2002-12-01), Wilsher et al.
patent: 2006/0119855 (2006-06-01), Li
patent: 2007/0171422 (2007-07-01), Birge et al.

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