Bath system for semiconductor wafers with obliquely mounted tran

Details Bath system for semiconductor wafers with obliquely mounted tran Bath system for semiconductor wafers with obliquely mounted tran

1998-11-14

2000-08-08

Coe, Philip R.

Cleaning and liquid contact with solids

Apparatus

With movable means to cause fluid motion

134902, B08B 312

Patent

active

060986433

ABSTRACT:
A bath system having a container with vertical upper sidewalls, a bottom and oblique walls. Each oblique wall joins the bottom to a sidewall, with ends joining the sidewalls, bottom and oblique walls to form an open enclosure for the container. An inlet is mounted to the bottom so that fresh processing liquid pass in a laminar flow over the surfaces of semiconductor wafers held in the container. High power sonic transducers are mounted to the oblique walls to deliver unimpeded sonic energy to the surfaces of the wafers. In operation, the sonic transducers on each oblique wall are multiplexed so that deleterious interference between the sonic waves from the two oblique walls is avoided.

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