Electrolysis: processes – compositions used therein – and methods – Electrolytic analysis or testing
Reexamination Certificate
2008-06-10
2008-06-10
Olsen, Kaj K. (Department: 1795)
Electrolysis: processes, compositions used therein, and methods
Electrolytic analysis or testing
C205S081000, C205S787000, C204S434000
Reexamination Certificate
active
07384535
ABSTRACT:
Analytical methods are disclosed for determining the quantity of brightener and leveler in an electroplating bath in the presence of other organic additives, such as accelerators, brighteners and suppressors. The methods improve the reproducibility of measuring brighteners and levelers in electroplating baths.
REFERENCES:
patent: 4038161 (1977-07-01), Eckles et al.
patent: 4132605 (1979-01-01), Tench et al.
patent: 4666567 (1987-05-01), Loch
patent: 4917774 (1990-04-01), Fisher
patent: 4917777 (1990-04-01), Fisher
patent: 5004525 (1991-04-01), Bernards et al.
patent: 5192403 (1993-03-01), Chang et al.
patent: 5223118 (1993-06-01), Sonnenberg et al.
patent: 5252196 (1993-10-01), Sonnenberg et al.
patent: 5972192 (1999-10-01), Dubin et al.
patent: 6365033 (2002-04-01), Graham et al.
patent: 6471845 (2002-10-01), Dukovic et al.
patent: 6508924 (2003-01-01), Gomez et al.
patent: 6551479 (2003-04-01), Graham et al.
patent: 6572753 (2003-06-01), Chalyt et al.
patent: 6592747 (2003-07-01), Horkans et al.
patent: 6673226 (2004-01-01), Kogan et al.
patent: 6709568 (2004-03-01), Han et al.
patent: 6808611 (2004-10-01), Sun et al.
patent: 6827839 (2004-12-01), Sonnenberg et al.
patent: 6936157 (2005-08-01), Robertson
patent: 2006/0151327 (2006-07-01), Sonnenberg et al.
patent: 199 11 447 (1999-03-01), None
patent: 0 597 474 (1994-05-01), None
patent: 0 785 297 (2000-01-01), None
patent: WO 99/57549 (1999-11-01), None
Tench et al., “Cyclic Pulse Voltammetric Stripping Analysis of Acid Copper Plating Baths”; J. Electrochem. Soc.: Electrochemical Science and Technology; Apr. 1985; pp. 831-834.
Haak et al., “Cyclic Voltammetric Stripping Analysis of Acid Copper Sulfate Plating Baths”; Plating and Surface Finishing; Mar. 1982; pp. 62-66.
Barstad Leon R.
Buckley Thomas
Cruz Raymond
Goodrich Trevor
Hamm Gary
Olsen Kaj K.
Piskorski John J.
Rohm and Haas Electronic Materials LLC
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