Batch furnace

Details Batch furnace Batch furnace

2005-04-12

2005-04-12

Fuqua, Shawntina (Department: 3742)

Electric resistance heating devices

Heating devices

Radiant heater

C392S418000, C219S390000, C219S405000, C219S411000, C118S724000, C118S725000, C118S050100

Reexamination Certificate

active

06879778

ABSTRACT:
A system and method for isothermally distributing a temperature across a semiconductor device. A furnace assembly is provided, which includes a processing tube configured to removably receive a wafer carrier having a full compliment of semiconductor wafers. A heating assembly is provided which can include a heating element positioned to heat air or other gases allowed to enter the process tube. The furnace assembly and process tube are capable of being vertically raised and lowered into a position enclosing the heating assembly within the process tube. Once the heating assembly forms a seal with the process tube, the process tube is exhausted and purged of air. Gas is then allowed to flow into the process tube and exchange heat with the heating element. The heated gas circulates through the process tube to convectively change the temperature of the wafers.

REFERENCES:
patent: 4723508 (1988-02-01), Yamazaki et al.
patent: 6191388 (2001-02-01), Cleaver et al.
patent: 6259061 (2001-07-01), Osawa
patent: 6407368 (2002-06-01), Hsu et al.
patent: 6444940 (2002-09-01), Saito et al.
patent: WO 9839609 (1998-09-01), None

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