Chemistry of inorganic compounds – Sulfur or compound thereof – Oxygen containing
Patent
1979-06-14
1981-04-14
Vertiz, O. R.
Chemistry of inorganic compounds
Sulfur or compound thereof
Oxygen containing
423622, C01B 1796, C01G 1702
Patent
active
042619653
ABSTRACT:
Basic zinc compound flake-like crystalline material suited for use in crystal-oriented electronic devices and method for preparation thereof comprising the steps of preparing a solution including at least zinc ions and sulfate ions, and causing precipitation of zinc sulfate crystals by causing a reaction of components of said solution with alkali when said solution is at a temperature in the range 50.degree. to 100.degree. C. and has a pH value of in the range 4 to 6.5.
REFERENCES:
patent: 1430269 (1922-09-01), Waring
patent: 1444484 (1923-02-01), Stevenson
patent: 1912332 (1933-05-01), Steinbring
patent: 2602727 (1952-06-01), Warinner
patent: 3136647 (1964-06-01), Waitkins et al.
patent: 3545994 (1970-12-01), Lott, Jr. et al.
patent: 3919403 (1975-11-01), Pullen et al.
patent: 4069299 (1978-01-01), Hodgson
Gordon et al., Precipitation from Homogeneous Solution, John Wiley & Sons, Inc. NY, NY, 1959, pp. 1-11.
Skoog et al., Fundamentals of Analytical Chemistry, Holt Rinehart & Winston, NY, NY 1963, pp. 188-191.
Venkatewarlu, Precipitation of Zinc Hydroxide with Alkali and its Solubility in Aqueous Ammonia, Jour. Indian Chemical Society, vol. 30 #1, 1953, pp. 30-32.
Fukuda Yoji
Fukushima Fumio
Hayakawa Shigeru
Matsuoka Tomizo
Nitta Tsuneharu
Matsushita Electric - Industrial Co., Ltd.
Straub Gary P.
Vertiz O. R.
LandOfFree
Basic zinc compound flake-like crystalline particle and method f does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Basic zinc compound flake-like crystalline particle and method f, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Basic zinc compound flake-like crystalline particle and method f will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-158903