Basic stripping and cleaning composition

Details Basic stripping and cleaning composition Basic stripping and cleaning composition

1996-11-05

1998-01-20

Breneman, R. Bruce

Cleaning and liquid contact with solids

Processes

Including application of electrical radiant or wave energy...

252 794, 252 793, 1566591, H01L 21302, B08B 308

Patent

active

057097569

ABSTRACT:
An aqueous and basic stripping and cleaning composition is provided which contains a hydroxylamine, ammonium fluoride, water and optionally DMSO. The pH of the composition is greater than about 8. Also provided is a method of stripping and cleaning utilizing the compositions of the invention.

REFERENCES:
patent: 4230523 (1980-10-01), Gajda
patent: 5279771 (1994-01-01), Lee
patent: 5320709 (1994-06-01), Bowden et al.
patent: 5334332 (1994-08-01), Lee
patent: 5417877 (1995-05-01), Ward
patent: 5419779 (1995-05-01), Ward
patent: 5482566 (1996-01-01), Lee
patent: 5556482 (1996-09-01), Ward et al.

Affiliated with

Also associated with

Rating

Basic stripping and cleaning composition does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Basic stripping and cleaning composition, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Basic stripping and cleaning composition will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-722612