Basic liquid composition suitable for producing transparent coat

Coating processes – With post-treatment of coating or coating material – Heating or drying

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

4273722, 4273741, 524379, 528 10, 528 12, 528 18, 528 21, 528 39, A23F 300

Patent

active

044851308

ABSTRACT:
The basic composition comprises, in solution in at least one organic solvent, with or without water, from 10 to 40% of a hard-enable organosilicic compound resulting from a first hydrolysis reaction achieved at a temperature lower than 50.degree. C. in the presence of a carboxylic acid and water on at least one R'Si(OR).sub.4 alkoxysilane with n=1 or 2, in association or without association with at least one Si(OR").sub.4 -alkoxysilane, then, a second hydrolysis at a temperature lower than 40.degree. C. after removal of the formed volatile solvents and addition of a less volatile solvent and at least one R"'Si(OR.sub.1).sub.3 -alkoxysilane, said reaction being followed with the setting of the pH to between 3.5 and 5.5 by an organic base.

REFERENCES:
patent: 3389114 (1968-06-01), Burzynski et al.
patent: 3451838 (1969-06-01), Burzynski et al.
patent: 3460980 (1969-08-01), Burzynski
patent: 3647510 (1972-03-01), Gagnon et al.
patent: 3650808 (1972-03-01), Gagnon
patent: 3707397 (1972-12-01), Gagnon
patent: 3790527 (1974-02-01), Merrill
patent: 4308371 (1981-12-01), Tanaka et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Basic liquid composition suitable for producing transparent coat does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Basic liquid composition suitable for producing transparent coat, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Basic liquid composition suitable for producing transparent coat will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-2134532

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.