Base precursor for heat-developable photosensitive material

Details Base precursor for heat-developable photosensitive material Base precursor for heat-developable photosensitive material

1984-03-30

1985-12-24

Michl, Paul R.

Organic compounds -- part of the class 532-570 series

Organic compounds

Heterocyclic carbon compounds containing a hetero ring...

562598, 562493, 562480, 562510, 562490, 562405, 546174, 549 79, 548146, 548217, 548499, 548494, 548332, 548330, 430151, 430619, C07D21355, C07C 6952, C07C 6976, G03C 524, G03C 100

Patent

active

045607630

ABSTRACT:
A base precursor for heat-developable photosensitive material is disclosed. The precursor is comprised of a compound represented by general formula (I) or (II):

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