Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing
Patent
1997-11-14
2000-12-26
Huff, Mark F.
Radiation imagery chemistry: process, composition, or product th
Radiation sensitive product
Identified backing or protective layer containing
428480, 428213, 528294, 528295, 528272, 430629, G03C 1795
Patent
active
061657018
ABSTRACT:
A base film for photographic films formed from a copolyester comprising 97 to 100 mol % of 2,6-naphthalenedicarboxylic acid and 0 to 3 mol % of a dicarboxylic acid other than 2,6-naphthalenedicarboxylic acid and (i) 87 to 99.8 mol % of ethylene glycol, 0.2 to 10 mol % of bis[4-(.omega.-hydroxyalkoxy)phenyl]sulfone and 0 to 3 mol % of a glycol other than ethylene glycol and bis[4-(.omega.-hydroxyalkoxy)phenyl]sulfone or (ii) 97 to 100 mol % of ethylene glycol, 0 to 3 mol % of a diol other than ethylene glycol and 1 to 7 mol % of an oxycarboxylic acid. This base film has an endothermic peak having a peak top temperature, measured by a differential scanning calorimeter, of 120 to 160.degree. C. and showing an endothermic energy of 0.3 mJ/mg or more.
REFERENCES:
patent: 3875119 (1975-04-01), Aoki et al.
patent: 4066624 (1978-01-01), Kawase et al.
patent: 4217441 (1980-08-01), Bayless
patent: 5496688 (1996-03-01), Okamoto et al.
Furuya Koji
Kimura Manabu
Suzuki Kenji
Teramoto Mitsuru
Watanabe Shinya
Huff Mark F.
Teijin Limited
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