Base film for photographic film

Radiation imagery chemistry: process – composition – or product th – Radiation sensitive product – Identified backing or protective layer containing

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430523, 430537, 430531, 428480, 428213, 428220, 528272, 528298, G03C 176

Patent

active

055938191

ABSTRACT:
A base Film for a photographic film, wherein (A) the base film is formed of a polyethylene-2,6-naphthalenedicarboxylate copolymer formed from 2,6-naphthalenedicarboxylic acid as a main acid component and ethylene glycol as a main glycol component; (B) a solution of 10 mg/ml of said copolymer in a hexafluoroisopropanol/chloroform mixed solvent having a hexafluoroisopropanol/chloroform weight ratio of 2/3 shows a light transmittance, T.sub.400, of at least 97%/cm at a wavelength of 400 nm; (C) the film has a yellow index, Y.sub.ID, of 5 or less; and (D) the film has a haze value of 2.0% or less.

REFERENCES:
patent: 3875119 (1975-04-01), Aoki et al.
patent: 5096803 (1992-03-01), Kanetake et al.
patent: 5288601 (1994-02-01), Greener et al.
patent: 5326689 (1994-07-01), Murayama
patent: 5334457 (1994-08-01), Wada et al.
patent: 5380577 (1995-01-01), Hamano et al.
patent: 5457017 (1995-10-01), Kimura et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Base film for photographic film does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Base film for photographic film, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Base film for photographic film will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-1387170

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.