Base film for magnetic recording medium and magnetic recording m

Details Base film for magnetic recording medium and magnetic recording m Base film for magnetic recording medium and magnetic recording m

1997-08-29

1999-11-02

Resan, Stevan A.

Stock material or miscellaneous articles

Structurally defined web or sheet

Continuous and nonuniform or irregular surface on layer or...

428212, 428457, 428694SG, 428694TR, 428900, G11B 5704

Patent

active

059766689

ABSTRACT:
A base film for a magnetic recording medium including one surface, on which a magnetic layer can be formed, having a surface roughness of center line average roughness Ra of 10 nm or less, a ten-point average roughness Rz of 80 nm or less and a maximum height Rmax of 150 nm or less. The base film includes the other surface having a surface roughness of center line average roughness Ra of 4.5 to 20 nm, a ten-point average roughness Rz of 35 to 350 nm and a maximum height Rmax of 40 to 400 nm.

REFERENCES:
patent: 4670319 (1987-06-01), Katoh et al.
patent: 4720412 (1988-01-01), Katoh et al.
patent: 4840830 (1989-06-01), Sakamoto et al.
patent: 4910068 (1990-03-01), Takagi et al.
patent: 5051292 (1991-09-01), Katoh et al.
patent: 5284699 (1994-02-01), Nishino et al.
patent: 5318823 (1994-06-01), Utsumi et al.
patent: 5328745 (1994-07-01), Kurihara et al.
patent: 5364684 (1994-11-01), Sakamoto et al.
patent: 5366783 (1994-11-01), Utsumi et al.
patent: 5429855 (1995-07-01), Kotani et al.
patent: 5516574 (1996-05-01), Ogawa et al.

Affiliated with

Also associated with

Rating

Base film for magnetic recording medium and magnetic recording m does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Base film for magnetic recording medium and magnetic recording m, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Base film for magnetic recording medium and magnetic recording m will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-2132182