Barrier layers for microelectromechanical systems

Semiconductor device manufacturing: process – Manufacture of electrical device controlled printhead

Reexamination Certificate

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C257S536000

Reexamination Certificate

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06849471

ABSTRACT:
A method for processing microelectromechanical devices is disclosed herein. The method prevents the diffusion and interaction between sacrificial layers and structure layers of the microelectromechanical devices by providing selected barrier layers between consecutive sacrificial and structure layers.

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