Fishing – trapping – and vermin destroying
Patent
1994-12-30
1997-02-04
Kunemund, Robert
Fishing, trapping, and vermin destroying
437192, 437246, H01L 21443
Patent
active
055997392
ABSTRACT:
Tungsten plugs are formed by passivating a substrate having a contact hole with SiH.sub.4, forming a nucleation layer on the passivated substrate by reducing WF.sub.6 with SiH.sub.4 at relatively low pressures and depositing tungsten to substantially fill the contact hole by reducing WF.sub.6 with H.sub.2 at relatively high pressures. Alternatively, rapid thermal annealing is used to cure pinhole defects in a titanium nitride layer on a substrate to avoid the formation of unwanted tungsten volcanoes.
REFERENCES:
patent: 4532702 (1985-08-01), Gigante et al.
patent: 4782380 (1988-11-01), Shankar et al.
patent: 4804560 (1989-02-01), Shioya et al.
patent: 5143861 (1992-09-01), Turner
patent: 5164330 (1992-11-01), Davis et al.
patent: 5164333 (1992-11-01), Schwalke et al.
patent: 5175126 (1992-12-01), Ho et al.
patent: 5183782 (1993-02-01), Onishi et al.
patent: 5200360 (1993-04-01), Bradbury et al.
patent: 5202579 (1993-04-01), Fujii et al.
patent: 5232871 (1993-08-01), Ho
patent: 5232873 (1993-08-01), Geva et al.
patent: 5233223 (1993-08-01), Murayama
patent: 5244534 (1993-09-01), Yu et al.
patent: 5260232 (1993-11-01), Muroyama et al.
patent: 5312775 (1994-05-01), Fujii et al.
patent: 5327011 (1994-07-01), Iwamatsu
patent: 5332691 (1994-07-01), Kinoshita et al.
patent: 5397742 (1995-03-01), Kim
patent: 5407698 (1995-04-01), Emesh
Merchant Sailesh M.
Nanda Arun K.
Roy Pradip K.
Kunemund Robert
Lucent Technologies - Inc.
Whipple Matthew
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