Coating apparatus – Gas or vapor deposition – With treating means
Reexamination Certificate
2007-10-02
2007-10-02
Kackar, Ram (Department: 1763)
Coating apparatus
Gas or vapor deposition
With treating means
C118S728000, C118S729000, C118S730000, C156S345510, C156S345540, C156S345550, C219S444100, C219S544000
Reexamination Certificate
active
11017711
ABSTRACT:
The barrel type susceptor for use in the semiconductor epitaxial growth is characterized in that a face plate5of a susceptor main body2having the shape of a truncated cone is partitioned into two or more in a longitudinal direction thereof, each partition being provided with a wafer mounting concave portion6a, 6b, 6con which a wafer is laid, and the inclination angle θa, θb, θc of a bottom face6a1, 6b1, 6c1of the concave portion for each partition to the vertical line is gradually decreased in each partition from the upper part to the lower part.
REFERENCES:
patent: 01208469 (1989-08-01), None
patent: 02212393 (1990-08-01), None
patent: 3-30269 (1991-03-01), None
patent: 6-151339 (1994-05-01), None
patent: 06151339 (1994-05-01), None
Merriam Webster's Collegiate Dictionary, 10th ed. (1994).
Miyamoto Toshikazu
Ohashi Tadashi
Eggerding Matthew
Kackar Ram
Tokuyama Toshiba Ceramics Co., Ltd.
Toshiba Ceramics Co. Ltd.
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