Metal treatment – Process of modifying or maintaining internal physical... – Chemical-heat removing or burning of metal
Patent
1974-12-20
1976-06-08
Satterfield, Walter R.
Metal treatment
Process of modifying or maintaining internal physical...
Chemical-heat removing or burning of metal
148186, 148188, H01L 736
Patent
active
039620000
ABSTRACT:
Disclosed is a method for diffusion doping of silicon and germanium semiconductors by the vapor phase transport of B.sub.2 O.sub.3 from a solid B.sub.2 O.sub.3 source to the semiconductor, wherein the solid B.sub.2 O.sub.3 source comprises a rigid, dimensionally stable, glass-ceramic body formed from certain barium aluminoborosilicate parent glass compositions which in mole percent consist essentially of over 40 and up to 60 SiO.sub.2, 10 to 30 Al.sub.2 O.sub.3, 20 to 40 B.sub.2 O.sub.3 and 3 to 20 alkaline earth oxides including 1 to 15 BaO.
REFERENCES:
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patent: 3518510 (1970-06-01), Lamming
patent: 3530016 (1970-09-01), Joseph
patent: 3540895 (1970-11-01), Scheidler et al.
patent: 3540951 (1970-11-01), Pammer et al.
patent: 3852128 (1974-12-01), Kreuzer
Bruss, Jr. Howard G.
Holler E. J.
Lynch Charles S.
Owens--Illinois, Inc.
Satterfield Walter R.
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