Baking device and baking method of baking a chemically...

Details Baking device and baking method of baking a chemically... Baking device and baking method of baking a chemically...

2005-11-04

2008-07-22

Leung, Philip H (Department: 3742)

Electric heating

Inductive heating

Specific heating application

C219S670000, C118S302000, C392S416000, C430S328000, C438S758000

Reexamination Certificate

active

07402782

ABSTRACT:
A heat treatment device for baking a chemically amplified resist film formed on a substrate after exposure but before development includes a table that supports the substrate, a heater that heats the substrate, a magnetic field generating unit that generates a magnetic field of lines of magnetic flux directed in a film thickness direction of the resist film and reverses the direction of the lines of magnetic flux, and a controller unit that controls the magnetic field generating unit to generate the magnetic field acting on the resist film at least while the substrate is being heated by the heater unit.

REFERENCES:
patent: 6279502 (2001-08-01), Azuma
patent: 6290824 (2001-09-01), Ishikawa et al.
patent: 6841342 (2005-01-01), Nishi et al.
patent: 07-106235 (1995-04-01), None
patent: 11-335833 (1999-12-01), None
patent: 2001-85323 (2001-03-01), None

Affiliated with

Also associated with

Rating

Baking device and baking method of baking a chemically... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Baking device and baking method of baking a chemically..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Baking device and baking method of baking a chemically... will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3968825