Radiation imagery chemistry: process – composition – or product th – Diazo reproduction – process – composition – or product – Composition or product which contains radiation sensitive...
Patent
1990-08-07
1993-08-24
Bowers, Jr., Charles L.
Radiation imagery chemistry: process, composition, or product th
Diazo reproduction, process, composition, or product
Composition or product which contains radiation sensitive...
430167, 430197, 430325, 5253273, 5253304, 5253305, 5253335, 525344, 525504, 525505, G03F 7012, G03F 732, C08F 1626
Patent
active
052387771
ABSTRACT:
A radiation-sensitive compound, which comprises a polymer including a plurality of azide-substituted aromatic ester groups and a plurality of carboxylic or sulphonic acid groups capable of imparting to the compound solubility in aqueous or alkaline medium. After image-wise exposure, the compound can be developed using an aqueous or alkaline developer. The compound is useful in the production of radiation sensitive plates for the manufacture of lithographic printing plates which can be baked to improve printing life.
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patent: 4229514 (1980-10-01), Kunita et al.
patent: 4994530 (1991-02-01), Etherington et al.
Etherington Terence
Kolodziejczyk Victor
Potts Rodney M.
Ren Jianrong
Bowers Jr. Charles L.
Chu John S.
DuPont (U.K.) Limited
Hand Francis C.
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