Baffle/settling chamber for a chemical vapor deposition equipmen

Details Baffle/settling chamber for a chemical vapor deposition equipmen Baffle/settling chamber for a chemical vapor deposition equipmen

1991-08-30

1993-05-18

Hart, Charles

Gas separation

Means within gas stream for conducting concentrate to collector

55201, 55319, 55462, 118326, B01D 1900

Patent

active

052117294

ABSTRACT:
A baffle/settling chamber removes solid particulates from the exhaust of a semiconductor deposition equipment while reducing pressure fluctuation in the exhaust to provide a more uniform deposition of chemicals. A container having an inlet baffle plate, an outlet baffle plate and three settling plates disposed there between are disposed in a chamber and reside serially in the exhaust flow.

REFERENCES:
patent: 3212234 (1965-10-01), McMinn
patent: 3250263 (1966-05-01), Gerjets
patent: 4113454 (1978-09-01), Cvacho
patent: 4539023 (1985-09-01), Boley
patent: 4717404 (1988-01-01), Fore
patent: 4881952 (1989-11-01), Masaru

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