Backup system and method for production of pressurized gas

Details Backup system and method for production of pressurized gas Backup system and method for production of pressurized gas

2005-06-10

2008-08-12

Doerrler, William C (Department: 3744)

Refrigeration

Cryogenic treatment of gas or gas mixture

Separation of gas mixture

C062S653000

Reexamination Certificate

active

07409835

ABSTRACT:
Systems and methods are disclosed for a gas production system to efficiently maintain a pressure of a gaseous output stream within a tight pressure range when the system changes normal operation to backup operation. In one preferred embodiment, during normal operation a backup vaporizer is kept in cold standby by directing a small portion of a liquefied gas stream away from the main heat exchanger to the backup vaporizer. In this way, the backup vaporizer is able to respond immediately to a shutdown of the main gas production system. During normal operation, the output of the backup vaporizer is recombined with the gaseous output stream to any avoid loss of product thereby increasing efficiency.

REFERENCES:
patent: 3485053 (1969-12-01), Grenier
patent: 4698079 (1987-10-01), Yoshino
patent: 5865206 (1999-02-01), Steigman et al.
patent: 5941098 (1999-08-01), Guillard et al.
patent: 5953937 (1999-09-01), Corduan et al.
patent: 6889524 (2005-05-01), O'Connor et al.
patent: 6945076 (2005-09-01), Garnier et al.
patent: 7092893 (2006-08-01), Megan et al.
patent: 2002/0170313 (2002-11-01), Zapp et al.
patent: 2007/0044506 (2007-03-01), Peyron
patent: 2007/0101763 (2007-05-01), Garnier et al.

Affiliated with

Also associated with

Rating

Backup system and method for production of pressurized gas does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Backup system and method for production of pressurized gas, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Backup system and method for production of pressurized gas will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4018023