Backside polish EUV mask and method of manufacture

Details Backside polish EUV mask and method of manufacture Backside polish EUV mask and method of manufacture

1998-12-04

2000-04-11

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

G03F 900

Patent

active

06048652&

ABSTRACT:
A method (100) of forming a reflective reticle blank includes forming (106) a reflective layer (108) over a flat substrate (104) and coupling a low thermal expansion material (112) to the reflective layer (108). After coupling the low thermal expansion material (112) to the reflective layer (108), the flat substrate (104) is removed. By forming the reflective layer (108) on the flat substrate (104), a low-defect, high reflectivity reflective layer (108) is formed. In addition, by removing the flat substrate (104), the reticle blank uses the low thermal expansion material (112) as substrate and exhibits minimized distortion during processing due to its low thermal expansion material.

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