Back to front alignment of elements on a substrate

Details Back to front alignment of elements on a substrate Back to front alignment of elements on a substrate

1992-11-24

1994-11-01

Turner, Samuel A.

Optics: measuring and testing

By dispersed light spectroscopy

Utilizing a spectrometer

356363, 356354, G01B 902

Patent

active

053611322

ABSTRACT:
A technique for aligning corresponding features on opposite surfaces of a transparent substrate. In one embodiment thereof a laser beam is applied to a pair of grating elements on one surface of the substrate to produce an interference fringe pattern on the opposite surface, the centerline between the grating elements being at a known distance from the features on the one surface and corresponding to the center bright space of the fringe pattern. A reference mark on a movable mask, which reference mark is at the same known distance from feature locations on the mask, is aligned with the center bright space of the interference fringe pattern and the feature locations on the mask can then be used to position features on the opposite surface which are aligned with the features on the one surface of the substrate.

REFERENCES:
patent: 5298988 (1994-03-01), Everett et al.
Jahns, et al. "Precise alignment . . . copying techniques", Optics Letters vol. 17 No. 6 Mar. 1992 pp. 390-392.
Flanders, et al., "A new interferometric alignment technique", Applied Physics Letters, vol. 31, No. 7, 1977, pp. 426-428.
King, et al., "Photolithographic Mask Alignment Using Moire Techniques", Applied Optics, vol. 11, No. 11, Nov. 1972, pp. 2455-2459.
Kinoshita, et al., "A dual grating alignment technique for x-ray lithography", J. Vac. Sci. Technol. B., vol. 1, No. 4, Oct. Dec. 1983, pp. 1276-1279.
Nomura, et al., "A New Interferometric Alignment Technique with Holographic Configuration", Japanese Journal of Applied Physics, vol. 24, No. 11, Nov. 1985, pp. 1555-1560.

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