Back-reflection X-ray crystallography method and system

Details Back-reflection X-ray crystallography method and system Back-reflection X-ray crystallography method and system

2008-12-04

2010-10-26

Kao, Chih-Cheng G (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Diffraction, reflection, or scattering analysis

Reexamination Certificate

active

07822177

ABSTRACT:
Provided is a method and system for back-reflection X-ray diffraction of a specimen that yields the orientation of a crystalline sample in a quick and an automated way. The method includes setting an approximate pre-selected X-ray detector to specimen distance, subjecting the specimen to X-rays, recording the Laue diffraction pattern, calculating the Miller indices of a fraction of the spots in the resulting pattern, averaging the Miller indices, moving a virtual representation of the specimen by a small amount along a line connecting the film to the specimen, changing the film-to-specimen distance, repeating the calculation, averaging and moving in small angular steps until the virtual representation of the specimen has been moved through a small distance range and best fits to the observed data, and determining the optimum film-to-specimen distance resulting in the smallest average Miller index.

REFERENCES:
patent: 5073918 (1991-12-01), Kamon

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