Organic compounds -- part of the class 532-570 series – Organic compounds – Azo
Patent
1994-11-18
1997-11-11
Powers, Fiona T.
Organic compounds -- part of the class 532-570 series
Organic compounds
Azo
534649, 534793, 534759, 534760, 534864, 534879, 534880, 430 7, 430321, 430191, C09B 2928, C09B 2946, C09B 3503, G03F 900
Patent
active
056865856
DESCRIPTION:
BRIEF SUMMARY
TECHNICAL FIELD
This invention relates to azo dyes for use in color filters, and more particularly to magenta-colored, red-colored or yellow-colored azo dyes for use in color filters.
BACKGROUND ART
Color filters, particularly the color filters used in solid-state image sensors such as charge combination device (CCD), liquid crystal display device (LCD) and the like, are usually produced by first forming a pattern from a photoresist and subsequently dyeing the pattern. However, this method is disadvantageous in that the dyeing process is complicated and difficult to control. Thus, JP-A-4-163552 and JP-A-4-128703 have proposed methods for producing color filters by patterning a photoresist containing a dyestuff such as pigment or dye. However, the method of JP-A-4-163552 is not suitable for production of color filters for use in CCD requiring a high resolution, because the pigment itself used therein contains particles of about 1 .mu.m size. On the other hand, the method of JP-A-4-128703 is inferior in the stability of colored pattern. In addition to the above, these methods both involve another important problem. That is, usual dyestuffs exist as an extraneous matter different from the alkali-developable resist. In the case of producing a color filter, the preferable thickness of resist film is 1 .mu.m or less, unlike the case of producing a semi-conductor. For this reason, a large amount of dyestuffs must be added to a resist composition comprising an alkali-soluble resin and an organic solvent. Actual dyestuffs, however, are soluble in neither of aqueous alkali solution and organic solvent, and therefore it is difficult to prepare a fine color pattern having a desired spectrum and a small film thickness from such dyestuffs.
DISCLOSURE OF INVENTION
This invention solves the above-mentioned problem by providing an azo dye for use in color filters excellent in spectral characteristics such as light absorption characteristic, permeation characteristic, etc. which can be used for preparing a resist composition for color filters excellent in properties such as resolution and free from scum, namely undeveloped residue, and to a method for producing color filters by the use of a photoresist composition containing said azo dye.
This invention relates to an azo dye for use in color filters which has in one molecule at least one sulfonamido group of which one hydrogen atom is substituted and is soluble in alkaline aqueous solution and organic solvents. Further, this invention also relates to a method for producing a color filter having a plurality of colored filter elements which comprises the steps of: composition containing an azo dye and drying the organic solvent-coating to form an adhering layer, provided that, in this step, said composition contains an alkali soluble resin and the above-mentioned azo dye, said dye is present in the organic solvent solution of the alkali soluble resin and the dye constituting said photoresist composition in an amount of 1/4 or more as expressed in terms of ratio by weight based on the alkali soluble resin, said dye has in one molecule at least one sulfonamido group of which one hydrogen atom is substituted, said dye has a desired color depth and has a specific absorption characteristic and a specific transmitting characteristic of a specific color demanded of the color filter element to be produced from said photoresist composition, said dye has a sufficient transmittance to the radiation ray used for exposure of the photoresist composition and has a sufficient solubility in the aqueous alkaline solution used in the alkali development mentioned below, and the pattern of the filter element formed by the development has the above-mentioned specific absorption characteristic and permeation characteristic; radiation ray selected from the group consisting of ultraviolet ray, far ultraviolet ray, electron beam, X ray and ion beam; pattern of the above-mentioned filter element; and the above-mentioned composition.
BEST EMBODIMENT FOR PRACTICE OF THE INVENTION
Among the azo
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Hishiro Yoshiki
Takeyama Naoki
Yamamoto Shigeki
Powers Fiona T.
Sumitomo Chemical Company Limited
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