Axial flow plasma shutter

Details Axial flow plasma shutter Axial flow plasma shutter

1986-04-17

1988-01-26

Moore, David K.

Electric lamp and discharge devices: systems

Discharge device load

With de-ionizing means in the cathode-anode circuit

315344, 313156, 313161, H01J 1714

Patent

active

047218916

ABSTRACT:
A shutter (36) is provided for controlling a beam, or current, of charged particles in a device such as a thyratron (10). The substrate (38) defines an aperture (60) with a gap (32) which is placeable within the current. Coils (48) are formed on the substrate (38) adjacent the aperture (60) to produce a magnetic field for trapping the charged particles in or about aperture (60). The proximity of the coils (48) to the aperture (60) enables an effective magnetic field to be generated by coils (48) having a low inductance suitable for high frequency control. The substantially monolithic structure including the substrate (38) and coils (48) enables the entire shutter assembly (36) to be effectively located with respect to the particle beam.

REFERENCES:
patent: 3881127 (1975-04-01), MacMaster et al.
patent: 4071801 (1978-01-01), Harvey
patent: 4088929 (1978-05-01), Weldon
patent: 4156159 (1979-05-01), Takagi
patent: 4429007 (1984-01-01), Bich et al.
patent: 4475006 (1984-10-01), Lee
patent: 4581118 (1986-04-01), Class et al.
patent: 4596945 (1986-06-01), Schumacher et al.

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