Gas separation – With guide means effecting removal of constituent layer out... – At escape means for heavier constituent
Patent
1979-12-03
1982-01-19
Spitzer, Robert H.
Gas separation
With guide means effecting removal of constituent layer out...
At escape means for heavier constituent
55457, B01D 4516
Patent
active
043114946
ABSTRACT:
The invention is a device which provides for separation of contaminants from a relatively high velocity stream of gas. The invention provides a first stage wherein the gas stream is decelerated and the contaminant particles are caused to separate from the air stream by interacting with a first surface. The interaction results in the particles to acquire a radial velocity vector and by virtue of the momentum of the contaminants particles. The contaminant particles are forced to the outer layer of the gas stream. The second stage of separation provides for further magnification of the radial velocity vector and also induces a slight tangential velocity component to the contaminant particle. By impacting the contaminants against a vane mounted within the gas stream, the contaminant particles, as a result of this impact, acquire a slight swirl or circular motion which causes the contaminant particles to be more localized. In the next stage of the cleaning device, the gas stream is rapidly accelerated by decreasing the area through which the gas stream must travel. This increase in velocity of the gas stream increases the separation for the smaller contaminant particles until a final separation stage is attained. In this final stage, the velocity of the gas stream is decreased maintaining flow separation between the contaminants and the gas stream. The contaminant particles continue along the periphery of the cleaning device into a discharge channel, while relatively clean gas exits axially from the device, and exits the cleaning device.
REFERENCES:
patent: 3591011 (1971-07-01), Holter et al.
patent: 3616619 (1971-11-01), Klein
patent: 3713280 (1973-01-01), Keller et al.
patent: 3895930 (1975-07-01), Campolong
Conner Wayne L.
Martin William G.
Facet Enterprises Inc.
Spitzer Robert H.
VanOphem Remy J.
LandOfFree
Axial flow gas cleaning device does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Axial flow gas cleaning device, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Axial flow gas cleaning device will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-1913601