Avoidance of pattern shortening by using off axis illumination w

Details Avoidance of pattern shortening by using off axis illumination w Avoidance of pattern shortening by using off axis illumination w

1995-09-21

1998-09-29

Moses, R. L.

Photocopying

Projection printing and copying cameras

Illumination systems or details

355 53, 355 67, G03B 2742, G03B 2754, G03B 2772

Patent

active

058152474

ABSTRACT:
A system and method of avoiding pattern shortening without resorting to generating a mask with a bias solve the direction dependent differences in exposure behavior in photolithography processes in the manufacture of semiconductor devices. Instead of designing a biased mask to solve the exposure problem, the pattern shortening effect is avoided by influencing the exposure process itself. By using an off axis illumination technique, the exposure is separated into different directions. In one embodiment, off axis illumination is applied in combination with special dipole apertures (i.e., two openings). The exposure is done in two or more parts, whereby the aperture is twisted between exposures. In another embodiment, off axis illumination is used in combination with special polarizer apertures. As with the first embodiment, the exposure is done in two or more parts, but in this case with differently polarized light.

REFERENCES:
patent: 5144362 (1992-09-01), Kamon et al.
patent: 5305054 (1994-04-01), Suzuki et al.
patent: 5392094 (1995-02-01), Kudo
patent: 5530518 (1996-06-01), Ushida et al.
patent: 5659429 (1997-08-01), Kudo
patent: 5661546 (1997-08-01), Taniguchi
patent: 5661601 (1997-08-01), Kang et al..

Affiliated with

Also associated with

Rating

Avoidance of pattern shortening by using off axis illumination w does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Avoidance of pattern shortening by using off axis illumination w, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Avoidance of pattern shortening by using off axis illumination w will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-690916