Patent
1977-02-08
1978-04-04
Edlow, Martin H.
357 30, 357 89, 357 90, H01L 2990
Patent
active
040830624
ABSTRACT:
An avalanche photodiode has a rectification barrier formed by an n.sup.+ -layer and a p-type layer of a low doping concentration. A thin p-layer having a higher doping concentration than a p.sup.- -layer is inserted between the p.sup.- -layer and a .pi.-layer, whereby the avalanche breakdown voltage of the photodiode is lowered considerably.
REFERENCES:
patent: 3621466 (1971-11-01), Misawa
patent: 3668555 (1972-06-01), Kasperkovitz
patent: 3814997 (1974-06-01), Takahashi
patent: 3886579 (1975-05-01), Ohuchi
patent: 3921092 (1975-11-01), Goronkin
patent: 3992715 (1976-11-01), Delagebeaudeuf
Kawakami Sumio
Ohuchi Hirobumi
Okamura Masahiro
Edlow Martin H.
Hitachi , Ltd.
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