Avalanche photodiode

Active solid-state devices (e.g. – transistors – solid-state diode – Heterojunction device – Light responsive structure

Reexamination Certificate

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C257S199000, C257S189000, C257S184000

Reexamination Certificate

active

11136466

ABSTRACT:
An avalanche photodiode has improved low-noise characteristics, high-speed response characteristics, and sensitivity. The avalanche photodiode includes a first conductivity type semiconductor layer, a second conductivity type semiconductor layer, a semiconductor multiplication layer interposed between the first conductivity type semiconductor layer and the second conductivity type semiconductor layer, and a semiconductor light-absorbing layer interposed between the semiconductor multiplication layer and the second conductivity type semiconductor layer. The avalanche photodiode further comprises a multiplication suppressing layer which suppresses multiplication of charge carriers in the semiconductor light-absorbing layer, has a thickness of 0.6 μm or less, and is located between the semiconductor light-absorbing layer and the second conductivity type semiconductor layer. The thickness of the semiconductor light-absorbing layer is 0.5 μm or more.

REFERENCES:
patent: 6104047 (2000-08-01), Watanabe
patent: 6720588 (2004-04-01), Vickers
patent: 2000-22197 (2000-01-01), None
Yonetsu, Hirho; “Optical Communication Element Engineering”, Kokaku Tosho, Inc., (May 20, 2000).
Watanabe, I. et al.; “Planar-structure Superlattice APDs”,Inst. of Electronics, Information and Communication Engineers, Technical Report of IEICE, pp. 69-74, (Oct. 1997).
Li, N. et al.; “InGaAs/InAlAs avalanche photodiode with undepleted absorber”,Applied Physics Letters, vol. 82, No. 13, pp. 2175-2177, (Mar. 31, 2003).

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