Avalanche diode with breakdown voltage controlled by gate...

Semiconductor device manufacturing: process – Making device or circuit responsive to nonelectrical signal – Responsive to electromagnetic radiation

Reexamination Certificate

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Details

C438S380000, C438S979000, C438S983000

Reexamination Certificate

active

07056761

ABSTRACT:
In an avalanche structure, different breakdown voltages are achieved by making use of a polygate and forming a highly doped p-n junction beneath the polygate, and adjusting the gate length and optionally the bias voltage of the gate.

REFERENCES:
patent: 5691558 (1997-11-01), Davies

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