Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1984-03-14
1985-07-02
Demers, Arthur P.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
118 501, 118324, 118719, 118720, 156345, 156643, 427 82, 427 86, C23C 1500
Patent
active
045266700
ABSTRACT:
Automatic loading mechanism for automatically transferring semiconductor wafers from storage cassettes onto disk shaped electrodes carried on a hexagonal electrode structure within a plasma reaction chamber. The system includes a reactor chamber, a transport mechanism for transporting semiconductor wafers from storage cassettes and to storage cassettes and a loading mechanism for transferring semiconductor wafers from said transport mechanism onto the electrode structure within the reactor chamber and for transferring processed wafers from said reactor chamber back to said transport means for transport to an output cassette.
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Demers Arthur P.
LFE Corporation
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