Automatically adjustable brush assembly for cleaning semiconduct

Details Automatically adjustable brush assembly for cleaning semiconduct Automatically adjustable brush assembly for cleaning semiconduct

1994-07-15

1995-12-19

Roberts, Jr., Edward L.

Brushing, scrubbing, and general cleaning

Machines

Brushing

15 77, A46B 1302

Patent

active

054758890

ABSTRACT:
An automatically adjustable brush assembly for cleaning semiconductor wafers. The brush assembly includes a first rotary brush, a brush carriage having first and second arms and a second rotary brush, and at least one pressure adjustment assembly positioned to engage at least one of the arms of the brush carriage and configured for automatically adjusting the pressure applied to the wafer surfaces by the first and second rotary brushes. The brush assembly further includes a control system coupled to the pressure adjustment assembly for controlling operation of the pressure adjustment assembly to selectively increase and decrease the pressure applied to the wafer by the first and second rotary brushes.

REFERENCES:
patent: 4382308 (1983-05-01), Curcio

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