Automatic wafer alignment system

Facsimile and static presentation processing – Facsimile – Specific signal processing circuitry

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Details

3401463H, 358101, 364515, H04N 718

Patent

active

043250777

ABSTRACT:
In the alignment system disclosed, herein a raster scanned video signal representing a selected portion of the wafer surface is analyzed for diagonal reference lines or features on the surface of the wafer utilizing a swept gating technique which extracts desired image features from an obscuring or noisy background. A given point on the wafer surface is determined by locating two oppositely-inclined diagonal features, the point being defined by their intersection. These two features are searched for simultaneously and independently, minimizing the search time.

REFERENCES:
patent: 3216311 (1965-11-01), Bibbero
patent: 3988535 (1976-10-01), Hickman
patent: 4115803 (1978-09-01), Morton
patent: 4186412 (1980-01-01), Arimura
patent: 4203132 (1980-05-01), Schmitt

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