Automatic variable rate evaporation source for thin film deposit

Details Automatic variable rate evaporation source for thin film deposit Automatic variable rate evaporation source for thin film deposit

1985-04-19

1986-04-01

Plantz, Bernard F.

Coating apparatus

Control means responsive to a randomly occurring sensed...

Sampling of associated base

118720, 118726, 118712, C23C 1454

Patent

active

045790833

ABSTRACT:
An apparatus for automatically controlling the rate of vacuum deposition of thin films on a substrate, consisting of an optical diaphragm or shutter in the form of two overlapping plates which together define a shutter opening between an evaporation crucible and a substrate. The overlapping plates are attached to a pair of rack gears to be moved in opposite directions by a pinion gear to vary the size of the shutter opening through which the evaporated material must pass to be deposited on the substrate. The rate of evaporation is sensed by a quartz crystal monitor and a signal therefrom is compared to a reference signal. The difference between the two signals is used to control the movement of the apertured plates thereby correcting the rate of deposition of the thin film.

REFERENCES:
patent: 3117024 (1964-01-01), Ross
patent: 3502051 (1970-03-01), Adams
patent: 4207836 (1980-06-01), Nonaka
patent: 4425871 (1984-01-01), Martin

Affiliated with

Also associated with

Rating

Automatic variable rate evaporation source for thin film deposit does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Automatic variable rate evaporation source for thin film deposit, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Automatic variable rate evaporation source for thin film deposit will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1079312