Automatic thin-film measuring apparatus

Details Automatic thin-film measuring apparatus Automatic thin-film measuring apparatus

1992-03-12

1994-06-14

Teska, Kevin J.

Boots, shoes, and leggings

364567, 364568, 364468, 364478, 36457101, 177 2511, 177 2512, 177 2513, 177 50, 414222, G01B 706, G06F 1520

Patent

active

053216342

ABSTRACT:
In an automatic thin-film measuring apparatus, the zero point of a precision balance is corrected according to directions from a data processing unit before and after the weight of a semiconductor substrate is measured, the surface temperature of the semiconductor substrate laid on a pan of the precision balance is measured, and the weight of the semiconductor substrate is measured when the surface temperature reaches a predetermined value. Furthermore, the cycle of variations in the zero point is found when the zero point is corrected, and the weight measurement of the semiconductor substrate is conducted during an integer multiple of the change cycle. Therefore, it is possible to enhance the precision of the weight measurement and its reproducibility and to shorten the measurement time without being influenced by low-frequency vibrations.

REFERENCES:
patent: 4661920 (1987-04-01), Haze
patent: 5104276 (1992-04-01), Severns et al.
"Differenz-und Ruckstandsbestimmung", Sartorius GmbH, Nov. 1986, pp. 1-2.
Haefer, "Oberflachen-und Dunnschicht-Technologie", Springer-Verlag . . . , 1987.

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