Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1992-12-22
1994-10-04
Rutledge, D.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041824, G03D 302
Patent
active
053530853
ABSTRACT:
An automatic processing system for photographic light-sensitive material, which includes an automatic processor having a processing tank containing a processing solution with which the material is processed, a replenisher of a concentrated processing replenisher chemical solution to the processing tank, an evaporator/distillator processor by which a waste liquid in photographic processing discharged from the automatic processor is evaporated and concentrated by heating, and vapor generated through the heating process is condensed by cooling process so that a condensate is produced. An electric dialysis device separates the condensate into an electric dialysis concentrated liquid and a desalted liquid. Cation exchange membranes and anion exchange membranes are arranged alternately in chambers to form concentrating chambers and desalting chambers alternately by both the ion membranes and chamber frames. The desalted liquid storage tank is provided for storing the desalted liquid which is supplied to the processing tank.
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patent: 4939073 (1990-07-01), Koboshi et al.
patent: 4984004 (1991-01-01), Yoda et al.
patent: 5040013 (1991-08-01), Kurokawa et al.
patent: 5145569 (1992-09-01), Schneider et al.
patent: 5237360 (1993-08-01), Patton
Kurematsu Masayuki
Tanaka Hideo
Konica Corporation
Rutledge D.
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