Automatic photomask or reticle washing and cleaning system

Details Automatic photomask or reticle washing and cleaning system Automatic photomask or reticle washing and cleaning system

1987-02-04

1987-12-29

Hornsby, Harvey C.

Cleaning and liquid contact with solids

Apparatus

Sequential work treating receptacles or stations with means...

134 66, 134113, B08B 302

Patent

active

047153920

ABSTRACT:
Automatic photomask or reticle washing and cleaning system comprises a foreign particle inspecting unit for inspecting whether or not foreign particles are attached to the surfaces of substrates; a washing and cleaning unit for washing and cleaning the surfaces of substrates with a cleaning liquid, thereby removing foreign particles and transfer means for withdrawing a substrate from a case, transferring the withdrawn substrate to the washing and cleaning unit, thereafter transferring the washed and cleaned substrate to the foreign particle inspecting unit and finally inserting the inspected substrate into the case again. In the washing and cleaning system, the washing and cleaning unit has a wash tub, means disposed in the wash tub for spraying or jetting a cleaning liquid against the surface of a substrate, means for rubbing the surfaces of the substrate which are wetted by the cleaning liquid, thereby removing foreign particles and washing means for washing away the cleaning liquid still remaining over the surfaces of the substrate even after removal of foreign particles.

REFERENCES:
patent: 4208760 (1980-06-01), Dexter et al.
patent: 4282825 (1981-08-01), Nagatomo et al.
patent: 4315705 (1982-02-01), Flint
patent: 4427332 (1984-01-01), Manriquez
patent: 4449885 (1984-05-01), Hertel et al.
patent: 4466766 (1984-08-01), Geren et al.
patent: 4500407 (1985-02-01), Boys et al.
patent: 4520834 (1985-06-01), DiCicco

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