Coating processes – Centrifugal force utilized
Patent
1982-10-29
1984-05-29
Lusignan, Michael R.
Coating processes
Centrifugal force utilized
118 52, 118320, 118321, 264311, 427425, B05D 312
Patent
active
044515073
ABSTRACT:
An automatic fluid dispensing apparatus for coating to a substantially uniform thickness a rotating surface, such as the surface of a semiconductor wafer, with a viscous liquid, such as a slurry of passivating glass. The wafer rotation rate is related to the radial movement of a dispensing arm to maintain a constant tangential velocity of the wafer at the radial location of the dispensing arm while a bead of the slurry is dispensed at a constant rate proportional to the tangential velocity to provide a spiral beaded coating of constant volume per square. By allowing the bead to heal during or following the dispense cycle, the viscous liquid spreads to a uniform thickness.
REFERENCES:
patent: 2487111 (1949-11-01), De Koning
patent: 3198657 (1965-08-01), Kimball et al.
patent: 4267212 (1981-05-01), Sakawaki
Operation and Service Manual, "Automatic Wafer Processing System," Veeco Macronetics, Jul. 1981, pp. 1-1-7.
News Release Headway Research, Inc., "A Moving Arm Dispenser For Large Spin Coaters," Nov. 1981, (Two Sheets).
Abandoned U.S. patent application, Ser. No. 164,346, Filed Jun. 30, 1980, abandoned on 8/16/82.
Beltz John P.
Hang Kenneth W.
Bell Janyce A.
Cohen Donald S.
Lazar Joseph D.
Lusignan Michael R.
Morris Birgit E.
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