Chemistry: electrical and wave energy – Apparatus – Coating – forming or etching by sputtering
Patent
1988-10-27
1991-01-22
Niebling, John F.
Chemistry: electrical and wave energy
Apparatus
Coating, forming or etching by sputtering
2041828, G01N 2728, G01N 2726, B01D 5702
Patent
active
049868918
ABSTRACT:
An electrophoresis machine is disclosed in which after a microporous support strip and a sample plate are placed in the machine, all electrophoresis processing, scanning and densitometer functions are automatically performed under computer control. The machine includes apparatus for automatic pipetting of liquid samples from the sample plate to the surface of the support strip, apparatus for applying electrophoresis current to the strip while simultaneously cooling it, apparatus for applying and spreading fluorescent staining reagent to the strip, and apparatus for incubating the strip and subsequently drying it. Mechanical aligning apparatus is provided for precisely aligning pipettes with application wells on the sample strip. Electrode bars and reagent spreader bars are provided to apply electrophoresing current to the strip and to spread reagent dumped onto the strip after electrophoresis. Circular indentations as well as rectangular indentations are provided as application wells on the sample strip. Spring loaded rollers are provided to reduce friction variation of a robotic assembly which translates a pipetting assembly between the sample plate and the sample strip. Multiple reagent bottle assemblies are provided for allowing one or more reagents to be dumped onto the strip after electrophoresing of the sample strip. Alternatively, apparatus is provided for spraying reagent onto the surface of the strip.
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Garsee Henry A.
Guadagno Philip A.
Kelley Charles D.
Sarrine Robert J.
Helena Laboratories Corporation
Niebling John F.
Starsiak Jr. John S.
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